Henniker Scientific Ltd, Warrington, UK, which supplies instruments, systems & technologies for vacuum science, thin-film deposition, UHV surface analysis, plasma surface treatment, plasma characterization and gas analysis, says that its latest TMC13 deposition rate controller has been extended further with 0.01Hz frequency resolution and support for multi-crystal sensors, with each crystal being controlled individually.
The versatile, multi-channel device has been designed for repeatable, reliable and accurate control of film thickness and rate in vacuum-based thin-film deposition processes.
The firm says that the feature-rich touch-screen interface can be easily customized to suit a particular operator preference and can be operated in both automatic and manual modes, providing direct display and control of film thickness, deposition rate and frequency value for up to six independent deposition sources.
The device also includes shutter relays for each channel, two analog inputs for the connection of pressure gauges, and two re-transmission analog outputs as standard, as well as an extensive and fully editable materials library.